JPH0332144B2 - - Google Patents
Info
- Publication number
- JPH0332144B2 JPH0332144B2 JP25614985A JP25614985A JPH0332144B2 JP H0332144 B2 JPH0332144 B2 JP H0332144B2 JP 25614985 A JP25614985 A JP 25614985A JP 25614985 A JP25614985 A JP 25614985A JP H0332144 B2 JPH0332144 B2 JP H0332144B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- transparent dielectric
- dielectric film
- refractive index
- magneto
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910045601 alloy Inorganic materials 0.000 claims description 15
- 239000000956 alloy Substances 0.000 claims description 15
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 claims description 15
- -1 rare earth transition metal Chemical class 0.000 claims description 12
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 11
- 229910052723 transition metal Inorganic materials 0.000 claims description 11
- 238000004544 sputter deposition Methods 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 7
- 238000003860 storage Methods 0.000 claims description 6
- 239000010408 film Substances 0.000 description 94
- 229910052581 Si3N4 Inorganic materials 0.000 description 14
- 239000010409 thin film Substances 0.000 description 13
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 11
- 230000000694 effects Effects 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 230000035945 sensitivity Effects 0.000 description 7
- 239000000203 mixture Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 230000005374 Kerr effect Effects 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 238000005546 reactive sputtering Methods 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000004767 nitrides Chemical group 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25614985A JPS62114141A (ja) | 1985-11-14 | 1985-11-14 | 磁気光学記憶素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25614985A JPS62114141A (ja) | 1985-11-14 | 1985-11-14 | 磁気光学記憶素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62114141A JPS62114141A (ja) | 1987-05-25 |
| JPH0332144B2 true JPH0332144B2 (en]) | 1991-05-10 |
Family
ID=17288584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25614985A Granted JPS62114141A (ja) | 1985-11-14 | 1985-11-14 | 磁気光学記憶素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62114141A (en]) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2826726B2 (ja) * | 1986-05-28 | 1998-11-18 | セイコーエプソン株式会社 | 光記録媒体の製造方法 |
| JPS6231052A (ja) * | 1985-04-25 | 1987-02-10 | Seiko Epson Corp | 光記録媒体 |
| JPS62139156A (ja) * | 1985-12-11 | 1987-06-22 | Sharp Corp | 光記録デバイスの製造方法 |
| JPH0785314B2 (ja) * | 1986-02-05 | 1995-09-13 | 沖電気工業株式会社 | 光磁気記録用媒体の保護膜 |
| JP2579465B2 (ja) * | 1986-06-10 | 1997-02-05 | セイコーエプソン株式会社 | 光磁気記録媒体の製造方法 |
| JP2735575B2 (ja) * | 1988-08-24 | 1998-04-02 | 日立マクセル株式会社 | 光磁気記録媒体 |
| JP2654689B2 (ja) * | 1989-05-16 | 1997-09-17 | 富士写真フイルム株式会社 | 光磁気記録媒体 |
| JP2631024B2 (ja) * | 1990-04-02 | 1997-07-16 | 富士写真フイルム株式会社 | 光磁気記録媒体の製造方法 |
-
1985
- 1985-11-14 JP JP25614985A patent/JPS62114141A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62114141A (ja) | 1987-05-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |